As one of the technologies for the neck of semiconductors, many people only know the photolithography machine, but do not know the importance of photoresist. This market is also monopolized by Japanese and American companies, and TOP5 manufacturers account for 85% of the world’s share.
The domestic photoresist can only be used in low-end process production lines before, and can achieve the level of G line (436nm) and I line (365nm). Currently, the ArF photoresist mainly used is still imported, and EUV photoresist is still No company can produce, and it is basically controlled by Japanese companies.
However, EUV photoresist is not urgently needed, because there is no EUV process mass production in China, and 193nm ArF photoresist is more important. At present, many domestic companies are working on key problems. This photoresist can be used from 28nm to 7nm. Advanced craftsmanship.
Today, NTU said on the interactive platform that the company’s ArF photoresist is undergoing customer testing as planned, which means that an important breakthrough has been made in domestic ArF photoresist technology, starting from research and development to production.
According to the previous news of Nanda Optoelectronics, the company started to develop the “193nm photoresist project” in 2017, and has obtained the relevant projects of the national “02 Special Project”. The company plans to achieve annual production through 3 years of construction, production and sales. The production scale of 25 tons of 193nm (ArF dry and immersion) photoresist products will meet the demand standards of the integrated Circuit industry.
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